SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - The study of defect inspection with die to model based on aerial image
Kunitani, Shinji, Horiuchi, Toshiyuki, Kobayashi, Atsushi, Nagashige, SusumuVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793097
File:
PDF, 510 KB
english, 2008