SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling
Lalovic, Ivan, Kawahira, Hiroichi, Zurbrick, Larry S., Kritsun, Oleg, McGowan, Sarah, Bendik, Joseph, Smith, Mark, Farrar, NigelVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801556
File:
PDF, 595 KB
english, 2008