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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Sensitivity improvement and noise reduction of array CD mapping on memory device using inspection tool
Yeo, Jeong-Ho, Allgair, John A., Raymond, Christopher J., Cho, Byeong-Ok, Park, Jin-Hong, Hur, Jinseok, Woo, Seok-Hoon, Choi, Seungwoon, Park, Chan-HoonVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814024
File:
PDF, 882 KB
english, 2009