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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Aerial imaging for source mask optimization: mask and illumination qualification
Sagiv, Amir, Zurbrick, Larry S., Montgomery, M. Warren, Finders, Jo, Kazinczi, Robert, Engelen, Andre, Duray, Frank, Minnaert-Janssen, Ingrid, Mangan, Shmoolik, Kasimov, Dror, Englard, IlanVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.832724
File:
PDF, 3.97 MB
english, 2009