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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Process characterization of pitch-split resist materials for application at 16nm node
Holmes, Steven J., Allen, Robert D., Tang, Cherry, Arnold, John C., Yin, Yunpeng, Chen, Rex, Fender, Nicolette, Osborn, Brian, Dabbagh, Gary, Liu, Sen, Colburn, Matthew, Varanasi, Rao P., Slezak, MarkVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846891
File:
PDF, 1.11 MB
english, 2010