![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - New tools to enable photomask repair to the 32nm node
Robinson, Tod, Zurbrick, Larry S., Montgomery, M. Warren, White, Roy, Bozak, Ron, Roessler, Ken, Arruza, Bernie, Hogle, Dennis, Archuletta, Mike, Lee, DavidVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.847238
File:
PDF, 4.45 MB
english, 2009