SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Improving 1D optical proximity effect matching for 45-nm node by scatterometry metrology
Chang, Dennis, Chen, Alek C., Han, Woo-Sung, Jungblut, Reiner, Shieh, Jason, Lin, Burn J., Yen, Anthony, Chen, Alek, Hinnen, Paul, Megens, Henry, Schreel, KoenVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.849553
File:
PDF, 295 KB
english, 2009