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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - The large contour data generation from divided image of photomask pattern of 32 nm and beyond
Murakawa, Tsutomu, Hosono, Kunihiro, Ogiso, Yoshiaki, Iwai, Toshimichi, Matsumoto, Jun, Nakamura, TakayukiVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.866056
File:
PDF, 2.63 MB
english, 2010