SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Reducing shot count through optimization-based fracture
Lin, Timothy, Maurer, Wilhelm, Abboud, Frank E., Sahouria, Emile, Akkiraju, Nataraj, Schulze, SteffenVolume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.897779
File:
PDF, 251 KB
english, 2011