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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - New yield-aware mask strategies
Jeong, Kwangok, Konishi, Toshio, Kahng, Andrew B., Progler, Christopher J.Volume:
8081
Year:
2011
Language:
english
DOI:
10.1117/12.899295
File:
PDF, 761 KB
english, 2011