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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Diffusion of acid from resist to Si-hardmask layer
Shirai, Masamitsu, Takeda, Hiroki, Hatsuse, Tatsuya, Okamura, Haruyuki, Wakayama, Hiroyuki, Nakajima, Makoto, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.915935
File:
PDF, 240 KB
english, 2012