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[IEEE 2015 IEEE International Integrated Reliability Workshop (IIRW) - South Lake Tahoe, CA, USA (2015.10.11-2015.10.15)] 2015 IEEE International Integrated Reliability Workshop (IIRW) - Comparison of random telegraph noise, endurance and reliability in amorphous and crystalline hafnia-based ReRAM
Beckmann, Karsten, Holt, Joshua S., Cady, Nathaniel C., Van Nostrand, JosephYear:
2015
Language:
english
DOI:
10.1109/iirw.2015.7437079
File:
PDF, 677 KB
english, 2015