SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Exposure of a halftone mask by conventional and off-axis illumination
Oh, Hye-Keun, Goo, Jung-Woung, Yim, Sug-Soon, Yoon, Tak-Hyun, Park, Seung-Wook, Nam, Byoung Sub, Kang, Hoyoung, Kim, Cheol-Hong, Han, Woo-Sung, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175421
File:
PDF, 856 KB
english, 1994