SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Phase imaging of EUV masks using a lensless EUV microscope
Harada, Tetsuo, Nakasuji, Masato, Nagata, Yutaka, Watanabe, Takeo, Kinoshita, Hiroo, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2027283
File:
PDF, 957 KB
english, 2013