SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Assessment of carbon layer growth induced by resists outgassing in multi e-beams lithography
Ackmann, Paul W., Hayashi, Naoya, Marusic, JC, Pourteau, ML, Cêtre, S., Pain, L., Mebiene-Engohang, AP, David, S., Labau, S., Boussey, J.Volume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2066152
File:
PDF, 747 KB
english, 2014