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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
Ferguson, Richard A., Wong, Alfred K. K., Brunner, Timothy A., Liebmann, Lars W., Brunner, Timothy A.Volume:
2440
Year:
1995
Language:
english
DOI:
10.1117/12.209267
File:
PDF, 880 KB
english, 1995