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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV implementation of assist features in contact patterns
Panning, Eric M., Goldberg, Kenneth A., Jiang, Fan, Raghunathan, Ananthan, Burkhardt, Martin, Saulnier, Nicole, Tritchkov, Alexander, Jayaram, Srividya, Word, JamesVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218315
File:
PDF, 1.17 MB
english, 2016