![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Improvement of alignment accuracy for scaled exposure field
Nakajima, Satoshi, Tanigawa, Makoto, Ishihama, Akira, Sakiyama, Keizo, Jones, Susan K.Volume:
3050
Year:
1997
Language:
english
DOI:
10.1117/12.275964
File:
PDF, 897 KB
english, 1997