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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - ArF excimer laser for 193-nm lithography
Stamm, Uwe, Kleinschmidt, Juergen, Heist, Peter, Bragin, Igor, Paetzel, Rainer, Basting, Dirk, Fuller, Gene E.Volume:
3051
Year:
1997
DOI:
10.1117/12.276007
File:
PDF, 667 KB
1997