SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Focused-ion-beam repair of embedded phase-shift masks
Cui, Zheng, Prewett, Philip D., Watson, John G., Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276022
File:
PDF, 1.37 MB
english, 1997