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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Reducing or eliminating line-end shortening and iso/dense bias by tuning NA and sigma
Toublan, Olivier, Schiavone, Patrick, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310720
File:
PDF, 1.28 MB
english, 1998