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SPIE Proceedings [SPIE Microelectronic Manufacturing '99 - Santa Clara, CA (Wednesday 22 September 1999)] In-Line Methods and Monitors for Process and Yield Improvement - Influence of metal deposition temperature on deep-submicrometer metal lithography
Subramaniam, Vijaya, Siems, Daniel D., Karnett, Martin P., Maheshwary, Sonu R., Sur, Harlan, Ajuria, Sergio A., Jakubczak, Jerome F.Volume:
3884
Year:
1999
Language:
english
DOI:
10.1117/12.361344
File:
PDF, 930 KB
english, 1999