SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation
Schlueter, Gerhard W., Scheuring, Gerd, Falk, Guenther, Brueck, Hans-Juergen, Schaetz, Thomas, Lehnigk, Sigrid, Behringer, Uwe F. W.Volume:
3996
Year:
2000
Language:
english
DOI:
10.1117/12.377103
File:
PDF, 2.27 MB
english, 2000