SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Lithography performance of contact holes: I. Optimization of pattern fidelity using MPG and MPG-II
Weaver, Suzanne, Lu, Maiying, Chabala, Jan M., Ton, Dinh, Sauer, Charles A., Mack, Chris A., Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392054
File:
PDF, 2.22 MB
english, 2000