SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Comparison of simulation approaches for chemically amplified resists
Erdmann, Andreas, Henke, Wolfgang, Robertson, Stewart A., Richter, Ernst, Tollkuehn, Bernd, Hoppe, Wolfgang, Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425196
File:
PDF, 226 KB
english, 2001