SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth
Lalovic, Ivan, Kroyan, Armen, Farrar, Nigel R., Taitano, Dennis, Zambon, Paolo, Smith, Adlai H., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435655
File:
PDF, 754 KB
english, 2001