SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography
Kakizaki, Kouji, Matsunaga, Takashi, Sasaki, Yoichi, Inoue, Toyoharu, Tanaka, Satoshi, Tada, Akifumi, Taniguchi, Hiroaki, Arai, Motohiro, Igarashi, Tatsushi, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435656
File:
PDF, 166 KB
english, 2001