SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
Choi, Se-Jin, Choi, Yong-Jun, Kim, Yang-Sook, Kim, Sang-Don, Kim, Deog-Bae, Kim, Jae-Hyun, Koh, Cha-Won, Lee, Geunsu, Jung, Jae Chang, Baik, Ki-Ho, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436828
File:
PDF, 1.35 MB
english, 2001