SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Subresolution assist feature implementation for high-performance logic gate-level lithography
Gabor, Allen H., Bruce, James A., Chu, William, Ferguson, Richard A., Fonseca, Carlos A., Gordon, Ronald L., Jantzen, Kenneth R., Khare, Mukesh, Lavin, Mark A., Lee, Woo-Hyeong, Liebmann, Lars W., MulVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474591
File:
PDF, 532 KB
english, 2002