SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Polarity effects of polymer on the 193-nm resist performance

Choi, Yong-Jun, Kim, Jung-woo, Kim, Jong-Yong, Yim, Yoon-Gil, Kim, Jae-Hyun, Jung, Jaechang, Min, Myoung-Ja, Bok, Cheolkyu, Shin, Kisoo, Fedynyshyn, Theodore H.
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Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485160
File:
PDF, 265 KB
english, 2003
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