SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Impact of illumination intensity profile on lithography simulation
Hwang, Chan, Smith, Bruce W., Kim, In-sung, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-SungVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536356
File:
PDF, 152 KB
english, 2004