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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application
Guilmeau, Isabelle D., Sturtevant, John L., Guerrero, Alice F., Blain, Vincent, Kremer, Stephanie, Vachellerie, Vincent, Lenoble, Damien, Nogueira, Patricia, Mougel, Sebastien, Chapon, Jean-DamienVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.538061
File:
PDF, 1.53 MB
english, 2004