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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Development of an etch-definable lift-off process for use with step and flash imprint lithography
Le, Ngoc V., Mackay, R. Scott, Gehoski, Kathleen A., Dauksher, William J., Baker, Jeffrey H., Resnick, Doug J., Dues, LauraVolume:
5751
Year:
2005
Language:
english
DOI:
10.1117/12.605932
File:
PDF, 740 KB
english, 2005