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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Design and fabrication of highly complex topographic nano-imprint template for dual damascene full 3-D imprinting
MacDonald, Susan, Weed, J. Tracy, Martin, Patrick M., Hughes, Greg, Stewart, Michael, Palmieri, Frank, Willson, C. GrantVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632312
File:
PDF, 593 KB
english, 2005