SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Data Analysis and Modeling for Process Control III - Hyper-NA model validation for the 45-nm node
Palmer, Shane R., Emami, Iraj, Tobin, Jr., Kenneth W., Bai, Min, van Adrichem, Paul J. M.Volume:
6155
Year:
2006
Language:
english
DOI:
10.1117/12.656059
File:
PDF, 483 KB
english, 2006