SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Phase-shift reticle design impact on patterned linewidth variation and LWR
Vasek, Jim, Martin, Patrick M., Naber, Robert J., Fu, Chong-Cheng, Chen, GongVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.686594
File:
PDF, 326 KB
english, 2006