SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Mask characterization for double patterning lithography
Bubke, Karsten, Naber, Robert J., Kawahira, Hiroichi, Cotte, Eric, Peters, Jan Hendrik, de Kruif, Robert, Dusa, Mircea, Fochler, Joerg, Connolly, BridVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.747006
File:
PDF, 277 KB
english, 2007