SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - The study of defect control and patterning performance for top coating free resist process
Henderson, Clifford L., Kim, Myoung-Soo, Jung, Hun-Rok, Ryu, Hae-Wook, Lee, Hong-Goo, Hong, Sung-Mok, Kim, Hak-Joon, Park, Sung-Nam, Gil, Myung-Goon, Kang, Hyo-SangVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772471
File:
PDF, 497 KB
english, 2008