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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2
Henderson, Clifford L., Felix, Nelson M., De Silva, Anuja, Sha, Jing, Ober, Christopher K.Volume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772635
File:
PDF, 750 KB
english, 2008