SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Study of EUVL mask defect repair using FIB-GAE method
Amano, Tsuyoshi, Kawahira, Hiroichi, Zurbrick, Larry S., Nishiyama, Yasushi, Shigemura, Hiroyuki, Terasawa, Tsuneo, Suga, Osamu, Shiina, Kensuke, Aramaki, Fumio, Hagiwara, Ryoji, Yasaka, AntoVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801214
File:
PDF, 2.68 MB
english, 2008