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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - International photomask linewidth comparison by NIST and PTB
Potzick, J., Kawahira, Hiroichi, Zurbrick, Larry S., Dixson, R., Quintanilha, R., Stocker, M., Vladar, A., Buhr, E., Häßler-Grohne, W., Bodermann, B., Frase, C. G., Bosse, H.Volume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801435
File:
PDF, 1.42 MB
english, 2008