SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Proximity matching for ArF and KrF scanners
Kim, Young Ki, Allgair, John A., Raymond, Christopher J., Pohling, Lua, Hwee, Ng Teng, Kim, Jeong Soo, Benyon, Peter, Depre, Jerome, Hong, Jongkyun, Serebriakov, AlexanderVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813609
File:
PDF, 407 KB
english, 2009