![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning
Dai, Huixiong, Levinson, Harry J., Dusa, Mircea V., Bencher, Chris, Chen, Yongmei, Sun, Shiyu, Xu, Xumou, Ngai, ChrisVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814376
File:
PDF, 625 KB
english, 2009