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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning
Selinidis, Kosta, Schellenberg, Frank M., La Fontaine, Bruno M., Thompson, Ecron, McMackin, Ian, Sreenivasan, S.V., Resnick, Douglas J.Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.815014
File:
PDF, 5.12 MB
english, 2009