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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Fabrication of a new BEAMETR chip for automatic electron beam size measurement
Babin, S., Raymond, Christopher J., Bay, K., Cabrini, S., Dhuey, S., Harteneck, B., Machin, M., Peroz, C.Volume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.850967
File:
PDF, 725 KB
english, 2010