SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Evaluation of a new model of mask topography effects
Pierrat, ChristopheVolume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879230
File:
PDF, 10.09 MB
english, 2011