SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - Defect printability of advanced binary film photomask
Naka, Masato, Konishi, Toshio, Yamaguchi, Shinji, Morishita, Keiko, Kanamitsu, Shingo, Yoshikawa, Ryoji, Mashita, Hiromitsu, Hirano, TakashiVolume:
8081
Year:
2011
Language:
english
DOI:
10.1117/12.899899
File:
PDF, 1.01 MB
english, 2011