SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - A Novel Dry Develop Method Of Photoresist - "Unzipping Development" By Flood UV Irradiation
Katsuragi, Hayato, Miyazaki, Masao, Ishikawa, Norio, Mori, Kiyoto, Yamada, Hitomi, Morita, Shinzo, Hattori, Shuzo, MacDonald, Scott A.Volume:
920
Year:
1988
Language:
english
DOI:
10.1117/12.968321
File:
PDF, 3.26 MB
english, 1988