SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks
Schiavone, Patrick, Martin, Luc, Browning, Clyde, Farys, Vincent, Sundermann, Frank, Narukawa, Shogo, Takikawa, Tadahiko, Hayashi, Naoya, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.981609
File:
PDF, 2.53 MB
english, 2012