Batch reactive ion etching of gallium nitride using...

Batch reactive ion etching of gallium nitride using photoresist as a mask

Mark Dineen, Sean Lee, Ligang Deng, Andrew L. Goodyear, Colin Welch
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Volume:
1
Year:
2004
Language:
english
Pages:
4
DOI:
10.1002/pssc.200405065
File:
PDF, 104 KB
english, 2004
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